Patent · US Expired

In-line non-contact depletion capacitance measurement method and apparatus

US6265890A · kind A · utility

24Cited by

3References

8Claims

0Family size

Assignee

LUCENT TECHNOLOGIES INC. · US

Inventors

Carlos M. Chacon · Orlando, US
Sailesh Chittipeddi · Allentown, US
Pradip K. Roy · Orlando, US

Key dates

Filing date	Aug 26, 1999
Grant date	Jul 24, 2001
Priority date	—
Expiry date	Aug 26, 2019

Classification

Technology area (CPC G)Physics
CPC primaryG01R27/2611
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A method and apparatus for in-line, non-contact depletion capacitance measurement of a semiconductor wafer using non-contact voltage measurement and non-contact surface photovoltage response.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.