Developing apparatus and developing nozzle
US6267516A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 30, 2000 |
| Grant date | Jul 31, 2001 |
| Priority date | — |
| Expiry date | May 30, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/3021
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A developing apparatus comprises a table on which is disposed a substrate having a resist coating film formed thereon, a nozzle for supplying a developing solution to the substrate disposed on the table, a liquid supplying mechanism for supplying the developing solution to the nozzle, and a moving mechanism for relatively moving the nozzle and the substrate, wherein the nozzle includes a liquid inlet port communicating with the liquid supplying mechanism, a liquid reservoir for temporarily storing the developing solution supplied from the liquid supplying mechanism through the liquid inlet port, a narrow passageway communicating with the bottom portion of the liquid reservoir to cause pressure loss of the developing solution coming from the liquid reservoir, a linear liquid discharge section having a discharge port passageway communicating with the narrow passageway, and a buffering member arranged within the discharge port passageway and in the vicinity of the outlet port of the narrow passageway, the buffering member weakening the strength of the developing solution coming out of the narrow passageway so as to weaken the impact given by the developing solution discharged from the…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.