Hitoshi Kosugi
18Patents
3h-index
32Co-inventors
60Inventor score
Filing activity: May 30, 2000 → Nov 23, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6267516A | Developing apparatus and developing nozzle | Physics | 23 | Expired |
| US6496245B2 | Developing method and developing apparatus | Emerging Cross-Sectional Technologies | 16 | Expired |
| US6780940B2 | Adhesive resin composition and method for separating adherends bonded together by the composition | Emerging Cross-Sectional Technologies | 3 | Expired |
| US8376637B2 | Photoresist coating and developing apparatus, substrate transfer method and interface apparatus | Electricity | 2 | Active |
| US7924396B2 | Coating/developing apparatus and pattern forming method | Physics | 2 | Active |
| US11309194B2 | Substrate liquid treatment apparatus | Electricity | 1 | Active |
| US11217451B2 | Substrate processing method and substrate processing apparatus | Electricity | 1 | Active |
| US7733472B2 | Method and system for determining condition of process performed for coating film before immersion light exposure | Physics | 1 | Active |
| US11545367B2 | Substrate processing apparatus, substrate processing method, and chemical liquid | Electricity | 1 | Active |
| US12002687B2 | System and methods for wafer drying | Electricity | 0 | Active |
| US7826032B2 | Circulation system for high refractive index liquid in pattern forming apparatus | Emerging Cross-Sectional Technologies | 0 | Active |
| US11515178B2 | System and methods for wafer drying | Electricity | 0 | Active |
| US8889337B2 | Film forming method, film forming apparatus and pattern forming method | Electricity | 0 | Active |
| US7651285B2 | Edge exposure apparatus, coating and developing apparatus, edge exposure method and coating and developing method, and storage medium | Physics | 0 | Active |
| US8420303B2 | Substrate processing method, computer-readable storage medium and substrate processing system | Physics | 0 | Active |
| US8133663B2 | Pattern forming method and apparatus | Physics | 0 | Active |
| US12371796B2 | Substrate processing apparatus, substrate processing method, and chemical liquid | Electricity | 0 | Active |
| US7431040B2 | Method and apparatus for dispensing a rinse solution on a substrate | Emerging Cross-Sectional Technologies | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.