Electrostatic deflector, for electron beam exposure apparatus, with reduced charge-up
US6268606A · kind A · utility
10Cited by
1References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 22, 1999 |
| Grant date | Jul 31, 2001 |
| Priority date | — |
| Expiry date | Jun 22, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3175
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electrostatic deflector of an electron beam exposure apparatus is disclosed. A cylindrical holding member is made of an insulating material. An electrode including a plurality of electrode members fixedly arranged in spaced relationship to each other and having at least a portion of the surface thereof grown with a metal film is disposed inside the holding member. The electrode members each formed with a metal film on the surface thereof are made of a conductive ceramic having a resistivity selected at least in the range of 0.001 .OMEGA..cndot.cm to 1000 .OMEGA..cndot.cm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.