Resist compositions
US6274286A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 26, 1998 |
| Grant date | Aug 14, 2001 |
| Priority date | — |
| Expiry date | Jun 26, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A chemically amplified positive resist composition comprising at least one basic compound of the following general formula (1) or (2): ##STR1## PA1 wherein R.sup.1, R.sup.2, R.sup.3, R.sup.7, and R.sup.8 are independently normal, branched or cyclic alkylene groups having 1 to 20 carbon atoms, R.sup.4, R.sup.5, R.sup.6, R.sup.9, and R.sup.10 are independently hydrogen, alkyl groups having 1 to 20 carbon atoms or amino groups, R.sup.4 and R.sup.5, R.sup.5 and R.sup.6, R.sup.4 and R.sup.6, or R.sup.8, R.sup.5 and R.sup.5, and R.sup.9 and R.sup.10, taken together, may form a ring, letters k, m and n are integers of 0 to 20, with the proviso that hydrogen is excluded from R.sup.4, R.sup.5, R.sup.6, R.sup.9 and R.sup.10 when k, m or n is equal to 0. The resist compositions of the present invention are effective for preventing resist films from thinning and for increasing the focus margin of an isolated pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.