Raster scan gaussian beam writing strategy and method for pattern generation
US6274290A · kind A · utility
27Cited by
8References
9Claims
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Key dates
| Filing date | Oct 26, 1998 |
| Grant date | Aug 14, 2001 |
| Priority date | — |
| Expiry date | Oct 26, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/143
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A hybrid exposure strategy for pattern generation uses wide field raster scan deflection and a uniformly moving stage to expose long stripes. Periodic analog wide field magnetic scan is augmented by a high speed electrostatic retrograde scan to keep the beam essentially stationary during exposure of rectangular flash fields and/or Gaussian beams. In this manner a staircase deflection trajectory is created for the beam. The position and dose data for each flash is derived from a rasterized data format using a decoder device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.