William J. DeVore
18Patents
7h-index
17Co-inventors
63Inventor score
Filing activity: Jan 26, 1982 → Aug 19, 2008
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5876902A | Raster shaped beam writing strategy system and method for pattern generation | Emerging Cross-Sectional Technologies | 57 | Expired |
| US6274290A | Raster scan gaussian beam writing strategy and method for pattern generation | Emerging Cross-Sectional Technologies | 27 | Expired |
| US6392333B1 | Electron gun having magnetic collimator | Electricity | 22 | Expired |
| US4469948A | Composite concentric-gap magnetic lens | Electricity | 14 | Expired |
| US5729022A | Composite concentric-gap magnetic lens and deflector with conical pole pieces | Electricity | 11 | Expired |
| US5376505A | Device fabrication entailing submicron imaging | Performing Operations; Transporting | 10 | Expired |
| US6002135A | Magnetic lens and deflector with inner and outer pole pieces with conical inner pole piece | Electricity | 7 | Expired |
| US7372195B2 | Electron beam source having an extraction electrode provided with a magnetic disk element | Electricity | 6 | Expired |
| US7427765B2 | Electron beam column for writing shaped electron beams | Electricity | 5 | Expired |
| US7800075B2 | Multi-function module for an electron beam column | Electricity | 3 | Active |
| US4987311A | Electron-detector diode biassing scheme for improved writing by an electron beam lithography machine | Electricity | 3 | Expired |
| US6521896B1 | Blanker assembly employing dielectric material | Electricity | 3 | Expired |
| US6768117B1 | Immersion lens with magnetic shield for charged particle beam system | Electricity | 2 | Expired |
| US6924494B2 | Method of exposing a target to a charged particle beam | Electricity | 2 | Expired |
| US7514682B2 | Electron anti-fogging baffle used as a detector | Electricity | 1 | Active |
| US6828996B2 | Electron beam patterning with a heated electron source | Electricity | 1 | Expired |
| US7227155B2 | Electrostatic deflection system with impedance matching for high positioning accuracy | Electricity | 1 | Expired |
| US7315029B2 | Electrostatic deflection system with low aberrations and vertical beam incidence | Electricity | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.