Carrier head with a flexible membrane for chemical mechanical polishing
US6277014A · kind A · utility
62Cited by
15References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 9, 1998 |
| Grant date | Aug 21, 2001 |
| Priority date | — |
| Expiry date | Oct 9, 2018 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B37/32
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A carrier head for a chemical mechanical polishing apparatus has a base, a flexible membrane extending beneath the base to define a pressurizable chamber, a support structure positioned in the chamber, and a spacer ring positioned outside the chamber. The flexible membrane includes a lower surface of the flexible membrane provides a mounting surface for a substrate, and a perimeter portion that extends in a serpentine path between the spacer ring the support structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.