Process for imaging of photoresist
US6277546A · kind A · utility
14Cited by
18References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 28, 1994 |
| Grant date | Aug 21, 2001 |
| Priority date | — |
| Expiry date | Nov 28, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/38
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to an improved lithographic imaging process for use in the manufacture of integrated circuits. The process provides protection to the photoresist film from airborne chemical contaminants.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.