Substrate support for a thermal processing chamber
US6280183A · kind A · utility
62Cited by
13References
1Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 1, 1998 |
| Grant date | Aug 28, 2001 |
| Priority date | — |
| Expiry date | Apr 1, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B31/14
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A substrate support, such as an edge ring, includes an inner portion, and an outer portion contiguous with the inner portion and extending radially outward therefrom. The inner portion has a raised annular extension forming a ridge for supporting a substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.