Photosensitive composition, method for forming pattern using the same, and method for manufacturing electronic parts
US6280897A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 23, 1997 |
| Grant date | Aug 28, 2001 |
| Priority date | — |
| Expiry date | Dec 23, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive composition comprising a polymer having a repeating segment represented by the following general formula (1A) and a compound which is capable of generating an acid by irradiation of an actinic radiation. ##STR1## PA1 wherein R.sup.11 is a hydrogen atom, an aliphatic hydrocarbon group, an alcoxy group, a halogen atom or a cyano group, R.sup.12 is an aliphatic hydrocarbon group or a cyclic olefin, R.sup.13 is either one of (a) a straight-chain olefin having 2 to 12 carbon atoms, a cyclic olefin or a heterocyclic group and (b) a hydrocarbon group represented by -- (CH.sub.2).sub.m --(m is an integer of 3 to 9), and R.sup.14 is a hydrophilic group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.