Lactone-containing compounds, polymers, resist compositions, and patterning method
US6280898A · kind A · utility
117Cited by
9References
21Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 24, 1999 |
| Grant date | Aug 28, 2001 |
| Priority date | — |
| Expiry date | Sep 24, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0397
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A novel lactone-containing compound is provided as well as a polymer comprising units of the compound. The polymer is used as a base resin to formulate a resist composition having a high sensitivity, resolution and etching resistance. ##STR1##
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.