Apparatus for removing photo-resist
US6283134A · kind A · utility
1Cited by
9References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 22, 1998 |
| Grant date | Sep 4, 2001 |
| Priority date | — |
| Expiry date | Jan 22, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/901
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus for removing photo-resist. The apparatus comprises carriers for carrying a wafer, hot plates to remove residue solvent on the wafer, a cooling plate to decrease the wafer temperature, an reverse unit to turn over the wafer, a development unit to develop and remove photo-resist on the wafer, a top scrubbing unit to clean a top side of the wafer, and a back scrubbing unit to clean a back side of the wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.