Methods of reducing proximity effects in lithographic processes
US6284419A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 24, 2001 |
| Grant date | Sep 4, 2001 |
| Priority date | — |
| Expiry date | Jan 24, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70441
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Methods of reducing proximity effects in lithographic processes wherein an integrated circuitry pattern is transferred from a mask onto a semiconductor substrate are described. In one embodiment, a desired spacing is defined between a main feature which is to reside on a mask and which is to be transferred onto the substrate, and an adjacent proximity effects-correcting feature. After the spacing definition, the dimensions of the main feature are adjusted relative to the proximity effects-correcting feature to achieve a desired transferred main feature dimension. In another embodiment, a desired spacing is defined between a main feature having an edge and an adjacent sub-resolution feature. The edge of the main feature is moved relative to the sub-resolution feature to achieve a desired transferred main feature dimension.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.