Ester compounds, polymers, resist compositions and patterning process
US6284429A · kind A · utility
33Cited by
6References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 24, 2000 |
| Grant date | Sep 4, 2001 |
| Priority date | — |
| Expiry date | Feb 24, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P20/55
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.