Chemical vapor deposition process for fabrication of hybrid electrodes
US6284654A · kind A · utility
41Cited by
21References
22Claims
0Family size
Assignee
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Key dates
| Filing date | Apr 16, 1998 |
| Grant date | Sep 4, 2001 |
| Priority date | — |
| Expiry date | Apr 16, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D1/696
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of fabricating an electrode structure for a ferroelectric device structure including a ferroelectric material, involving chemical vapor deposition of a hybrid electrode constituting a multilayer electrode structure or an alloyed electrode structure, using either bubbler delivery or liquid delivery chemical vapor deposition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.