Condenser for extreme-UV lithography with discharge source
US6285737A · kind A · utility
57Cited by
12References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 21, 2000 |
| Grant date | Sep 4, 2001 |
| Priority date | — |
| Expiry date | Jan 21, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70983
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Condenser system, for use with a ringfield camera in projection lithography, employs quasi grazing-incidence collector mirrors that are coated with a suitable reflective metal such as ruthenium to collect radiation from a discharge source to minimize the effect of contaminant accumulation on the collecting mirrors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.