Jet cleaning device for developing station
US6286178A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 28, 2000 |
| Grant date | Sep 11, 2001 |
| Priority date | — |
| Expiry date | Apr 28, 2020 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B5/02
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A jet-cleaning device for a developing station is described, which jet-cleaning device is capable of removing chemical solution from the back surface of a silicon wafer without the need to perform time-consuming adjustment of knife ring position. The jet-cleaning device has a spin suction pad and a knife ring. The spin suction pad is used to support a silicon wafer. Inside the suction pad is a groove capable of delivering a jet of air onto the exposed wafer back surface so that dripping chemical solution can be blown away. The knife ring is erected under the wafer around the suction pad so that the sputtering of chemical solution back into the suction pad area is prevented.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.