Monomer, high molecular compound and photosensitive composition
US6291129A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 28, 1998 |
| Grant date | Sep 18, 2001 |
| Priority date | — |
| Expiry date | Aug 28, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/115
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A monomer represented by the following general formula (m-1): ##STR1## wherein R is a group having an alicyclic skeleton, R.sup.2 s may be the same or different and are individually hydrogen atom, halogen atom or monovalent organic group, X.sup.1 is a bivalent organic group containing a heteroatom, j is an integer of 0 to 3, and R.sup.1 is a group selected from the following groups, PA1 a monovalent organic group having Si (R1-1), and EQU --(X.sup.2).sub.k --R.sup.4 --(X.sup.3).sub.m --C(R.sup.6).sub.3 (R1-2), wherein X.sup.2 and X.sup.3 are a bivalent organic group containing a heteroatom, k and m are an integer of 0 to 3, R.sup.4 is a bivalent alkyl group, R.sup.6 s may be the same or different and are individually hydrogen atom, halogen atom or monovalent organic group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.