Image formation method with photosensitive material
US6291145A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 9, 1998 |
| Grant date | Sep 18, 2001 |
| Priority date | — |
| Expiry date | Mar 9, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2022
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Image-formation methods and photosensitive materials used in such methods are disclosed that form very high-resolution patterns. The photosensitive materials comprise an ingredient that is triggered by a radical to undergo a latent-image-forming reaction. The radicals are produced by photons from an illumination light. Alternatively, the ingredient is triggered by a reactive-intermediate compound that is activated by the exposure-produced radical. The photosensitive materials possess a non-linear sensitivity characteristic in which the latent-image reaction density increases according to the m.sup.th power (m>1) of the incident light intensity. The photosensitive material can be applied to a sensitive substrate for exposure. Multiple exposures of the sensitive substrate are performed using a projected mask pattern in the presence of a radical deactivator. The multiple exposures can be performed while: (a) changing the exposure intensity distribution on the photosensitive material, or (b) shifting the projected mask pattern and the sensitive substrate relative to each other by a specified amount, or (c) using a different projected mask pattern for each exposure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.