Self-aligned deep trench isolation to shallow trench isolation
US6297127A · kind A · utility
23Cited by
1References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 22, 2000 |
| Grant date | Oct 2, 2001 |
| Priority date | — |
| Expiry date | Jun 22, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/76232
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Shallow trench isolation is combined with optional deep trenches that are self-aligned with the shallow trenches, at the corners of the shallow trenches, and have a deep trench width that is controlled by the thickness of a temporary sidewall deposited in the interior of the shallow trench and is limited by the sidewall deposition thickness of the deep trench fill.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.