Stencil masks and methods of manufacturing stencil masks
US6300017A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 20, 1998 |
| Grant date | Oct 9, 2001 |
| Priority date | — |
| Expiry date | Aug 20, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/20
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In one aspect, the invention encompasses a method of manufacturing a stencil mask comprising: a) defining a plurality of opening locations within a substrate; b) providing a dopant within the substrate, the dopant being provided in a pattern to form a plurality of first regions doped to a concentration with a dopant and one or more second regions not doped to the concentration with the dopant, individual first regions surrounding individual opening locations; c) forming a plurality of openings within the opening locations, the individual openings extending into the substrate; and d) forming a stencil mask from the substrate having the openings extending therein. In another aspect, the invention encompasses a stencil mask comprising: a) a substrate; b) a plurality of openings extending through the substrate; and c) a pattern of dopant within the substrate, the pattern comprising a plurality of first locations doped to a concentration with a dopant and one or more second locations not doped to the concentration with the dopant, individual first locations surrounding individual openings.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.