Ivan L. Berry, III
58Patents
16h-index
81Co-inventors
87Inventor score
Filing activity: Dec 15, 1983 → May 21, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6756085B2 | Ultraviolet curing processes for advanced low-k materials | Electricity | 593 | Expired |
| US6576300B1 | High modulus, low dielectric constant coatings | Emerging Cross-Sectional Technologies | 553 | Expired |
| US6759098B2 | Plasma curing of MSQ-based porous low-k film materials | Electricity | 545 | Expired |
| US6558755B2 | Plasma curing process for porous silica thin film | Electricity | 534 | Expired |
| US8071451B2 | Method of doping semiconductors | Electricity | 524 | Active |
| US6913796B2 | Plasma curing process for porous low-k materials | Emerging Cross-Sectional Technologies | 507 | Expired |
| US6281135A | Oxygen free plasma stripping process | Emerging Cross-Sectional Technologies | 269 | Expired |
| US9425041B2 | Isotropic atomic layer etch for silicon oxides using no activation | Electricity | 137 | Active |
| US9431268B2 | Isotropic atomic layer etch for silicon and germanium oxides | Electricity | 126 | Active |
| US6548416B2 | Plasma ashing process | Electricity | 52 | Expired |
| US6638875B2 | Oxygen free plasma stripping process | Emerging Cross-Sectional Technologies | 45 | Expired |
| US9406535B2 | Ion injector and lens system for ion beam milling | Electricity | 27 | Active |
| US6630406B2 | Plasma ashing process | Electricity | 23 | Expired |
| US9536748B2 | Use of ion beam etching to generate gate-all-around structure | Electricity | 21 | Active |
| US6664737B1 | Dielectric barrier discharge apparatus and process for treating a substrate | Electricity | 20 | Expired |
| US9779955B2 | Ion beam etching utilizing cryogenic wafer temperatures | Electricity | 20 | Active |
| US6834656B2 | Plasma process for removing polymer and residues from substrates | Electricity | 14 | Expired |
| US7629272B2 | Ultraviolet assisted porogen removal and/or curing processes for forming porous low k dielectrics | Electricity | 14 | Active |
| US6734120B1 | Method of photoresist ash residue removal | Emerging Cross-Sectional Technologies | 11 | Expired |
| US9837254B2 | Differentially pumped reactive gas injector | Electricity | 11 | Active |
| US9916993B2 | Ion injector and lens system for ion beam milling | Electricity | 9 | Active |
| US9812349B2 | Control of the incidence angle of an ion beam on a substrate | Electricity | 7 | Active |
| US10580628B2 | Differentially pumped reactive gas injector | Electricity | 7 | Active |
| US11062920B2 | Ion injector and lens system for ion beam milling | Electricity | 6 | Active |
| US6300017A | Stencil masks and methods of manufacturing stencil masks | Physics | 6 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.