Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groups
US6303263A · kind A · utility
10Cited by
13References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 25, 1998 |
| Grant date | Oct 16, 2001 |
| Priority date | — |
| Expiry date | Feb 25, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention is directed to a high-performance irradiation sensitive resists and to a polymer resin composition useful for making the same. In accordance to the present invention, the polymer resin comprises a dual blocked polymer resins. Specifically, the dual blocked polymer resin comprises at least two different acid labile protecting groups which block some, but not all, of the polar functional groups of the polymer resin. a chemically amplified resist system comprising said dual blocked polymer resin; at least one acid generator; and a solvent is also provided herein.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.