Patent · US Expired

Method of predicting the curvature radius of the microlens

US6304387A · kind A · utility

1Cited by
1References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 19, 2000
Grant dateOct 16, 2001
Priority date
Expiry dateMay 19, 2020

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB29D11/00365
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

The invention proposes a method of predicting the curvature radius of the microlens. By adjusting a spin speed of spin coating and exposure energy during a photolithography step, a volume of the patterned microlens material layer is controlled. Then a lens-forming step is performed to transform the patterned microlens material layer into a microlens. After measuring a diameter of the microlens, the volume of the microlens material layer is multiplied by a contraction coefficient to calculate a volume of the microlens. Then the diameter and the volume of the microlens are used to calculate a curvature radius.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.