Method for forming self-aligned contact with liner
US6306759A · kind A · utility
10Cited by
6References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 5, 2000 |
| Grant date | Oct 23, 2001 |
| Priority date | — |
| Expiry date | Sep 5, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/76831
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for forming self-aligned contact (SAC) is disclosed to improve device reliability. The method includes forming a dielectric liner over the contact opening before the contact plug is filled in. Optional contact implantation before and after the liner formation can be added to enhance the doping profile of the device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.