Method and apparatus for dechucking a workpiece from an electrostatic chuck
US6307728A · kind A · utility
15Cited by
4References
26Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 21, 2000 |
| Grant date | Oct 23, 2001 |
| Priority date | — |
| Expiry date | Jan 21, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2007
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method and apparatus that provides a dechucking voltage applied to an electrostatic chuck that facilitates removal of a workpiece or workpiece therefrom. The method incorporates residual chucking force information obtained from the preceding dechuck operation to modify and improve the dechucking algorithm for the subsequent wafer dechucking cycle. To avoid charge accumulation on the electrostatic chuck when processing a succession of workpieces, the chucking and dechucking voltages reverse polarity after each workpiece is dechucked.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.