Cleaning apparatus
US6308361A · kind A · utility
12Cited by
8References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 27, 1999 |
| Grant date | Oct 30, 2001 |
| Priority date | — |
| Expiry date | Jul 27, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67046
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A cleaning apparatus is suitable for cleaning workpieces that require a high degree of cleanliness, such as semiconductor wafers, glass substrates, or liquid crystal displays. The cleaning apparatus has a holding device for holding the substrate and a cleaning unit capable of slidably contacting the surface of the substrate. The cleaning unit has a nozzle for ejecting high-pressure cleaning liquid onto the substrate, and a cleaning member surrounding the nozzle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.