Semiconductor device using polymer-containing photoresist, and process for manufacturing the same
US6312865A · kind A · utility
13Cited by
15References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 30, 1998 |
| Grant date | Nov 6, 2001 |
| Priority date | — |
| Expiry date | Dec 30, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F222/06
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The present invention relates to a semiconductor device using a copolymer-containing photoresist, and a process for manufacturing the same. As a norbornene derivative (monomer) having a hydrophilic group is synthesized and introduced to the backbone chain of a polymer, the polymer according to the present invention has excellent etching resistance and heat resistance, which are the characteristic points of alicyclic olefin structure, and provide excellent resolution due to prominent enhancement of adhesiveness resulted from introducing a hydrophilic group (--OH).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.