Electrical impedance matching system and method
US6313584A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 24, 2000 |
| Grant date | Nov 6, 2001 |
| Priority date | — |
| Expiry date | Apr 24, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32183
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system and method for processing substrates having an improved matching system. A matching controller (1) is utilized to control multiple matching networks (MNA, MNB, MNC), thus providing improved, more rapid and stable matching. The matching controller can also automatically set up initial matching conditions required during and immediately after plasma initiation, to thereby provide faster and more reliable initial matching, and reduced operator involvement. The system also provides improved instrumentation, for more accurate phase and amplitude detection, and an improved arrangement of power detectors (6A, 6B, 6C). The matching network (MNA, MNB, MNC) also incorporates a circuit for reliable control of tunable elements in a matching network, and a device for protecting tunable elements against damage are also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.