Boride electrodes and barriers for cell dielectrics
US6316800A · kind A · utility
13Cited by
15References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 4, 2000 |
| Grant date | Nov 13, 2001 |
| Priority date | — |
| Expiry date | May 4, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10B12/485
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Titanium boride (TiB.sub.x), zirconium boride (ZrB.sub.x) and hafnium boride (HfB.sub.x) barriers and electrodes for cell dielectrics for integrated circuits, particularly for DRAM cell capacitors. The barriers protect cell dielectrics from diffusion and other interaction with surrounding materials during subsequent thermal processing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.