Reflective surface for CVD reactor walls
US6319556A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 9, 1999 |
| Grant date | Nov 20, 2001 |
| Priority date | — |
| Expiry date | Nov 9, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/0284
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A reflector plate is provided for scattering radiant heat energy in a semiconductor processing reactor chamber to achieve uniform temperature across a substrate to be processed. The surface is characterized by a plurality of adjoining depressions with substantially no planar sections among the depressions. The width to depth ratio for the depressions averages over 3:1. Crests separating the depressions define an angle of greater than about 60.degree., thus providing a relatively smooth texture for the reflecting surface. The reflecting surface is thus easy to clean. A method of manufacturing the reflector plate comprises removing material from a planar metal surface by ball-end milling. The depth of each depression and degree of overlap with adjacent depressions can randomly vary within selected ranges. A highly specular finish is then provided on the stippled surface by gold electroplating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.