Apparatus and method for determining porosity
US6319736A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 19, 2000 |
| Grant date | Nov 20, 2001 |
| Priority date | — |
| Expiry date | Jun 19, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2015/0846
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention is related to an apparatus and a non-destructive method for determining the porosity of an element, particularly a thin film, formed on a substrate, said substrate being positioned in a pressurized chamber, said chamber being at a predetermined pressure and at a predetermined temperature. According to this method a gaseous substance like e.g. toluene vapor is admitted in said chamber and after a predetermined period of time the porosity of the thin film is determined by means of at least on ellipsometric measurement. Particularly, the optical characteristics resulting from this in-situ ellipsometry are used to determine the amount of gaseous substance condensed in the pores of the film. These amounts are used to calculate the porosity of the film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.