Patent · US Expired

Method and device for measuring structures on a transparent substrate

US6323953A · kind A · utility

20Cited by

9References

38Claims

0Family size

Assignee

Leica Microsystems Wetzlar GmbH · DE

Inventors

Carola Blaesing-Bangert · Kassel, DE
Klaus Rinn · Heuchelheim, DE
Ulrich Kaczynski · Bad Nauheim, DE
Mathias Beck · Solms, DE

Key dates

Filing date	Feb 2, 1999
Grant date	Nov 27, 2001
Priority date	—
Expiry date	Feb 2, 2019

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70691
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A measuring device for measuring structures on a transparent substrate includes an incident-light illuminating device, an imaging device, and a detector device for the imaged structures and a measuring stage for receiving the substrate. The stage is displaceable in an interferometrically measurable fashion perpendicularly to and relative to an optical axis of the imaging device. The measuring stage is designed as an open frame with a receiving edge for the substrate. A transmitted-light illuminating device is provided beneath the measuring stage. The optical axis of the transmitted light illuminating device is aligned with that of the incident-light illuminating device.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.