Hermetically sealed transducer and methods for producing the same
US6326682A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 21, 1998 |
| Grant date | Dec 4, 2001 |
| Priority date | — |
| Expiry date | Dec 21, 2018 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2203/0181
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A reduced size, hermetically sealed semiconductor transducer and methods for fabricating the same. In a preferred embodiment, the transducer comprises a transducer wafer including a diaphragm which deflects upon the application of a force thereto. At least one semiconductor transducer element and one electrical contact are disposed on a top surface of the transducer wafer, with the electrical contact coupled to the semiconductor element and extending to a peripheral portion of the wafer. A cover member is provided that is dimensioned to surround the semiconductor element. A peripheral glass frit bond is formed between the cover member and the transducer wafer, and between the cover member and at least a portion of the electrical contact. An aperture is formed in a top portion of the cover member, positioned above a region bounded by the peripheral glass bond. This aperture functions to prevent air gap formation in the peripheral glass frit bond. A sealing member hermetically seals the aperture, whereby a vacuum is maintained between the transducer element and the cover member, the transducer element thereby being hermetically sealed from the external environment, while at least a p…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.