Integrated pad and belt for chemical mechanical polishing
US6328642A · kind A · utility
51Cited by
41References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 14, 1997 |
| Grant date | Dec 11, 2001 |
| Priority date | — |
| Expiry date | Feb 14, 2017 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24D11/06
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
An integrated pad and belt for polishing a surface comprising a belt integrated with a polishing pad that forms a seamless polishing surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.