Negative type resist composition
US6329119A · kind A · utility
6Cited by
2References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 28, 2000 |
| Grant date | Dec 11, 2001 |
| Priority date | — |
| Expiry date | Apr 28, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/122
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A negative type resist composition is provided, which provides excellent resolution, satisfactory profile and outstanding process stability: is suitable for exposure using deep ultra violet ray; and comprises alkali soluble resin, acid generator, crosslinking agent, and a basic compound represented by the following formula (I) ##STR1## wherein, A represents bivalent aliphatic hydrocarbon residue which may be optionally interrupted by imino group, sulfide group, or disulfide group, X represents nitrogen atom or C(NH.sub.2), and R.sup.1 and R.sup.2 independently represent hydrogen or alkyl.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.