Substrate processing apparatus
US6332724A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 1, 2000 |
| Grant date | Dec 25, 2001 |
| Priority date | — |
| Expiry date | Sep 1, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Outside air taken in from the outside is cooled to a predetermined temperature by a cooler, and the air cooled by the cooler flows through a low temperature side flow path in a heat exchanger, whereas outside air flows through a high temperature side flow path in the heat exchanger, which allows heat to be exchanged between the cooled air and the outside air. The air, flowing through the low temperature side flow path in the heat exchanger and warmed up by the outside air flowing through the high temperature side flow path, is warmed and humidified by a warmer and a humidifier, and the air with predetermined temperature and humidity is supplied to a coating processing unit. Moreover, the outside air, flowing through the high temperature side flow path in the heat exchanger and cooled by the air flowing through the low temperature side flow path, is warmed by a warmer, and the air with a predetermined temperature is supplied to a developing processing unit. Thus, an apparatus for regulating the temperature and humidity of air to be supplied to the coating processing unit and the developing processing unit can be downsized, and running costs for electric power consumption and the lik…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.