Device and method for detecting and preventing arcing in RF plasma systems
US6332961A · kind A · utility
76Cited by
5References
40Claims
0Family size
Assignee
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Key dates
| Filing date | Jun 2, 2000 |
| Grant date | Dec 25, 2001 |
| Priority date | — |
| Expiry date | Jun 2, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0206
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system and method for detecting and preventing arcing in plasma processing systems. Arcing is detected and characterized by measuring and analyzing electrical signals from a circuit coupled to the plasma. After characterization, the electrical signals can then be correlated with arcing events occurring during a processing run. Information can be obtained regarding location, severity, and frequency of arcing events. The system and method better diagnose the causes of arcing and provide improved protection against undesirable arcing, which can cause damage to the system and the workpiece.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.