Apparatus for cleaning edges of contaminated substrates
US6334229B1 · kind B1 · utility
32Cited by
8References
31Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 7, 1999 |
| Grant date | Jan 1, 2002 |
| Priority date | — |
| Expiry date | Jan 7, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus for cleaning edges of substrates is described. The present invention provides a cleaning mechanism that cleans particles off the edge of the wafer based on friction and/or a difference in tangential velocity at a point of contact between the wafer and the cleaning mechanism.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.