Processing system
US6334983B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 5, 1999 |
| Grant date | Jan 1, 2002 |
| Priority date | — |
| Expiry date | Oct 5, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/53204
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A processing system has an upper electrode with gas discharge holes of a shape corresponding to the external we of insulating members. The insulating members are formed of a poly(ether etherketone) resin, a polyimide resin, a poly(ether imide) resin or the like. Each insulating member has a step at its outer surface and an internal longitudinal through hole tapered to expand toward the processing chamber. The insulating members are pressed in the gas discharge holes to bring the steps into contact with shoulders formed in the sidewalls of the gas discharge holes. A part of each insulting member, as fitted in the gas discharge hole, projects from a surface of the upper electrode that faces a susceptor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.