Projection exposure apparatus
US6341006B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 25, 1999 |
| Grant date | Jan 22, 2002 |
| Priority date | — |
| Expiry date | Oct 25, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/946
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A projection exposure apparatus for projecting a pattern image of an illuminated mask onto a substrate. The optical path can be divided into a plurality of hermetic blocks each having an inert gas sealed therein by a plurality of partition devices. According a one aspect of the invention, a hermetic sealing member is disposed in the space between the substrate-side of the projection optical system and the substrate for replacing the atmosphere existing in the optical path of the illuminating light in that space by a substance other than oxygen. According to another aspect of the invention, a plurality of independent chambers are formed in a frame. Lids, piping, and valves in the chambers are opened or closed in response to the value detected by oxygen density sensors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.