Gas purge protection of sensors and windows in a gas phase processing reactor
US6344151B1 · kind B1 · utility
11Cited by
22References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 27, 2000 |
| Grant date | Feb 5, 2002 |
| Priority date | — |
| Expiry date | Apr 27, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S156/916
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A gas purged viewport for endpoint detection in a gas phase processing chamber is provided which prevents contamination of an optical monitoring window by use of a purge gas flow. The purge gas purges the viewport and prevents deposition of byproducts and contaminants on the window which will adversely effect endpoint detection. The gas purge viewport includes a prechamber between the optically transparent window and the process chamber. The purge gas is passed through the prechamber and into the processing chamber to purge the window. The gas purge system may also be used to purge other parts such as sensors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.