Composition and method for polishing rigid disks
US6347978B1 · kind B1 · utility
4Cited by
16References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 22, 1999 |
| Grant date | Feb 19, 2002 |
| Priority date | — |
| Expiry date | Oct 22, 2019 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B37/044
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method for polishing computer rigid disks comprising bringing at least one surface of the rigid disk into contact with a polishing pad and applying a composition to the rigid disk comprising at least one hydroxylamine additive and colloidal silica to give a polished rigid disk.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.