Heater for processing chamber
US6350320B1 · kind B1 · utility
247Cited by
17References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 22, 2000 |
| Grant date | Feb 26, 2002 |
| Priority date | — |
| Expiry date | Feb 22, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3244
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A gas delivery apparatus and method for directing a flow of gas to the edge of a substrate at an angle to the radial direction of the substrate is provided. The apparatus directs the gas from a gas opening, over a plurality of grooves that are angled relative to a radial line originating at a center of the gas delivery apparatus. Subsequently, the gas is flowed over a portion of the substrate to prevent reactive gases from depositing on selective portions of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.