Coaxial electromagnet in a magnetron sputtering reactor
US6352629B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Jul 10, 2000 |
| Grant date | Mar 5, 2002 |
| Priority date | — |
| Expiry date | Jul 10, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3408
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A magnetron sputter reactor capable of ionizing 15% or more of the metal atoms sputtered from the target. A small magnetron having closed bands of opposed magnetic polarity is rotated about the center of the target, and a large amount of power is applied to the target. Thereby the effective power density determined by the magnetron area is increased. A DC coil is wrapped around the space between the target and the substrate being sputter coated to generate an axial magnetic field to guide the metal ions towards the substrate. The pedestal electrode supporting the substrate may be negatively biased to accelerate the metal ions to deep within high aspect-ratio holes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.