Method and apparatus for neutralizing space charge in an ion beam
US6359286B1 · kind B1 · utility
7Cited by
7References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 9, 2000 |
| Grant date | Mar 19, 2002 |
| Priority date | — |
| Expiry date | Mar 9, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/006
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Space charge effects in an ion implanter can be caused by the mutual repulsion of ions of a particular polarity in a beam of ions which tend to cause the beam to “blow up” and become uncontrollable. This occurs for example in the ion implanter along the path of the ion beam and in particular at regions of external electric field. Introducing into the ion beam a second polarity of ions space charge neutralises the ion beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.