Stephen Moffatt
86Patents
11h-index
83Co-inventors
81Inventor score
Filing activity: May 13, 1987 → Jan 19, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8404499B2 | LED substrate processing | Electricity | 459 | Active |
| US5969366A | Ion implanter with post mass selection deceleration | Electricity | 40 | Expired |
| US8148663B2 | Apparatus and method of improving beam shaping and beam homogenization | Performing Operations; Transporting | 32 | Active |
| US5883391A | Ion implantation apparatus and a method of monitoring high energy neutral contamination in an ion implantation process | Electricity | 30 | Expired |
| US6100536A | Electron flood apparatus for neutralizing charge build-up on a substrate during ion implantation | Electricity | 30 | Expired |
| US7800081B2 | Pulse train annealing method and apparatus | Electricity | 25 | Active |
| USD959490S1 | Display screen or portion thereof with graphical user interface | General | 23 | Active |
| US4825087A | System and methods for wafer charge reduction for ion implantation | Electricity | 22 | Expired |
| US7075165B2 | Embedded waveguide detectors | Emerging Cross-Sectional Technologies | 18 | Expired |
| US8829392B2 | Apparatus and method of improving beam shaping and beam homogenization | Performing Operations; Transporting | 15 | Active |
| US7151881B2 | Impurity-based waveguide detectors | Emerging Cross-Sectional Technologies | 14 | Expired |
| US6909588B2 | Substrate holder for retaining a substrate within a processing chamber | Electricity | 10 | Expired |
| US6515408B1 | Ion beam apparatus and a method for neutralizing space charge in an ion beam | Electricity | 10 | Expired |
| US7372690B2 | Substrate holder which is self-adjusting for substrate deformation | Electricity | 8 | Expired |
| US7795816B2 | High speed phase scrambling of a coherent beam using plasma | Electricity | 7 | Active |
| US6359286B1 | Method and apparatus for neutralizing space charge in an ion beam | Electricity | 7 | Expired |
| US7745309B2 | Methods for surface activation by plasma immersion ion implantation process utilized in silicon-on-insulator structure | Electricity | 5 | Active |
| US7569463B2 | Method of thermal processing structures formed on a substrate | Electricity | 5 | Active |
| US8150242B2 | Use of infrared camera for real-time temperature monitoring and control | Electricity | 5 | Active |
| US9018110B2 | Apparatus and methods for microwave processing of semiconductor substrates | Electricity | 5 | Active |
| US8518838B2 | Method of thermal processing structures formed on a substrate | Electricity | 5 | Active |
| US9499909B2 | Methods for photo-excitation of precursors in epitaxial processes using a rotary scanning unit | Electricity | 4 | Active |
| US9123527B2 | Apparatus and methods for pulsed photo-excited deposition and etch | Emerging Cross-Sectional Technologies | 4 | Active |
| US8785815B2 | Aperture control of thermal processing radiation | Physics | 4 | Active |
| US9908200B2 | Apparatus and method of improving beam shaping and beam homogenization | Performing Operations; Transporting | 3 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.