Dual resist dispense nozzle for wafer tracks
US6360959B1 · kind B1 · utility
0Cited by
4References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 13, 2000 |
| Grant date | Mar 26, 2002 |
| Priority date | — |
| Expiry date | Jun 13, 2020 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05B9/002
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A dual tip nozzle replaces a single tip nozzle in a resist applicator station to double the number of photoresists that are available. The resist applicator station is of the type having a nozzle holder block, at least one single tip nozzle attached to the nozzle holder bock, and a first resist line extending through the nozzle holder block and into engagement with the nozzle. The dual tip nozzle includes two cavities having respective orifices. Each cavity receives a separate resist line for dispensing separate photoresists.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.