Eric Kent
20Patents
7h-index
16Co-inventors
66Inventor score
Filing activity: Apr 9, 1999 → May 17, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6245584A | Method for detecting adjustment error in photolithographic stepping printer | Electricity | 52 | Expired |
| US6051348A | Method for detecting malfunction in photolithographic fabrication track | Physics | 49 | Expired |
| US9355200B2 | Method and apparatus for design of a metrology target | Physics | 13 | Active |
| US6170494A | Method for automatically cleaning resist nozzle | Physics | 13 | Expired |
| US6336960B1 | System and method for purging air bubbles from filters | Performing Operations; Transporting | 12 | Expired |
| US6130016A | Method for forming semiconductor structures using a calibrating reticle | Physics | 11 | Expired |
| US6318913A | Semiconductor wafer manufacturing method and apparatus for an improved heat exchanger for a photoresist developer | Performing Operations; Transporting | 8 | Expired |
| US9804504B2 | Method and apparatus for design of a metrology target | Physics | 6 | Active |
| US6418946B1 | Apparatus for automatically cleaning resist nozzle | Physics | 5 | Expired |
| US6529623B1 | Stepper lens specific reticle compensation for critical dimension control | Physics | 4 | Expired |
| US6482573B1 | Exposure correction based on reflective index for photolithographic process control | Emerging Cross-Sectional Technologies | 3 | Expired |
| US6368985B1 | Dual track/stepper interface configuration for wafer processing | Physics | 2 | Expired |
| US6238747A | Mechanism for dispensing liquid onto an integrated circuit wafer with minimized back-splash | Physics | 2 | Expired |
| US6250822A | Semiconductor wafer manufacturing method and apparatus for an improved heat exchanger for a photoresist developer | Performing Operations; Transporting | 2 | Expired |
| US10296681B2 | Process based metrology target design | Physics | 1 | Active |
| US10007744B2 | Process based metrology target design | Physics | 1 | Active |
| US6082379A | Mechanism for cleaning an integrated circuit wafer hot plate while the hot plate is at operating temperature | Performing Operations; Transporting | 1 | Expired |
| US6361599B1 | Mechanism for dispensing liquid onto an integrated circuit wafer with minimized back-splash | Physics | 1 | Expired |
| US6299688A | Developer nozzle clean combs | Performing Operations; Transporting | 0 | Expired |
| US6360959B1 | Dual resist dispense nozzle for wafer tracks | Performing Operations; Transporting | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.